Ion implantation electron flooding requirements from a user's perspective
- 1 January 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 6 (1-2) , 399-404
- https://doi.org/10.1016/0168-583x(85)90664-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- High current dosimetry techniquesRadiation Effects, 1979
- Effects of Thin Conductive Film Mask on Ion ImplantationJournal of the Electrochemical Society, 1978