Surface band-bending assessment by photocurrent techniques. Application to III - V semiconductors
- 1 June 1997
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 12 (6) , 678-686
- https://doi.org/10.1088/0268-1242/12/6/006
Abstract
In epitaxial layers with a large area to thickness ratio, surface and interface space charge regions behave as transverse resistance - capacitance systems modulating the effective volume that takes part in the electrical conductivity. In this work it is shown that in photoconductivity spectroscopy experiments these surface and interface photovoltaic effects can become dominant, therefore giving information about the sample surface and interface band-bending. In photoconductivity spectroscopy, procedures to identify the signatures of such band bending are described. The present technique to assess surface bending is first applied to gated and ungated GaAs samples, to validate the present model. N-type AlGaAs and undoped InGaAs strained buffer layers, with various degrees of strain and surface roughness, are also characterized by this technique.Keywords
This publication has 6 references indexed in Scilit:
- Design of InGaAs linear graded buffer structuresApplied Physics Letters, 1995
- Surface photovoltages due to pulsed sources: Implications for photoemission spectroscopyPhysical Review B, 1994
- Photoconductive frequency-resolved spectroscopy of semiconductors: an analysis of lifetime distributionsSemiconductor Science and Technology, 1993
- The analysis of the temperature dependence of photoconductive frequency-resolved spectroscopy in the presence of carrier trapping: Application to polycrystalline siliconJournal of Applied Physics, 1993
- Orientation dependence of mismatched InxAl1−xAs/In0.53Ga0.47As HFETsJournal of Crystal Growth, 1991
- Fermi level and surface barrier of GaxIn1−xAs alloysApplied Physics Letters, 1981