The metallurgical characterization of coatings
- 15 August 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 53 (1) , 41-54
- https://doi.org/10.1016/0040-6090(78)90371-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Krypton entrapment in pulse-biased sputter-deposited metalsThin Solid Films, 1978
- Columnar grains and twins in high-purity sputter-deposited copperJournal of Vacuum Science and Technology, 1974
- Room-Temperature Recrystallization in Thick Bias-Sputtered Copper DepositsJournal of Applied Physics, 1971