Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication
- 1 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 481-485
- https://doi.org/10.1016/0167-9317(90)90155-m
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Exposure instrumentation for the application of x-ray lithography using synchrotron radiationReview of Scientific Instruments, 1989
- Sub-half-micron critical dimension control in x-ray lithography mask technologyJournal of Vacuum Science & Technology B, 1988
- Highly-sensitive novolak-based positive X-ray resistMicroelectronic Engineering, 1986