Results of ion implantation into silicon in the 100 MeV Range: I: Oxygen and boron implantation
- 16 April 1982
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 70 (2) , 463-472
- https://doi.org/10.1002/pssa.2210700213
Abstract
No abstract availableKeywords
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