Plasma deposition of amorphous hydrogenated carbon films on III-V semiconductors
- 1 February 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 157 (1) , 97-104
- https://doi.org/10.1016/0040-6090(88)90350-1
Abstract
No abstract availableKeywords
This publication has 37 references indexed in Scilit:
- Optical and interfacial electronic properties of diamond-like carbon filmsThin Solid Films, 1984
- Surface analysis of diamondlike carbon filmsJournal of Vacuum Science & Technology A, 1983
- Interfacial electrical properties of ion-beam sputter deposited amorphous carbon on siliconIEEE Electron Device Letters, 1983
- Ion beam sputter-deposited diamondlike filmsJournal of Vacuum Science and Technology, 1982
- Structural investigation of thin films of diamondlike carbonJournal of Applied Physics, 1981
- Electron spectroscopy of ion beam and hydrocarbon plasma generated diamondlike carbon filmsJournal of Vacuum Science and Technology, 1981
- Chemical modification of the electrical properties of hydrogenated amorphous carbon filmsSolid State Communications, 1980
- Diamond-like carbon films produced in a butane plasmaThin Solid Films, 1979
- Infrared transparent and amorphous carbon grown under ion impact in a butane plasmaThin Solid Films, 1978
- Ion-Beam Deposition of Thin Films of Diamondlike CarbonJournal of Applied Physics, 1971