Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
- 1 April 1996
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 96-98, 50-54
- https://doi.org/10.1016/0169-4332(95)00464-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Gas flow dynamics in laser ablation depositionJournal of Applied Physics, 1992
- On the origin of spatial nonuniformities in the composition of pulsed-laser-deposited filmsJournal of Applied Physics, 1991
- Pulsed-laser evaporation technique for deposition of thin films: Physics and theoretical modelPhysical Review B, 1990
- Optical Absorption and Expansion of Laser-Produced PlasmasPhysics of Fluids, 1969