Comparative study on phase formation in Al-Pd thin film by ion beam mixing and thermal annealing
- 1 February 1991
- journal article
- research article
- Published by Springer Nature in Journal of Materials Science
- Vol. 26 (3) , 721-725
- https://doi.org/10.1007/bf00588310
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Ion induced mixing in Al/Pd thin filmsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- The Al−Pd (Aluminum-Palladium) systemBulletin of Alloy Phase Diagrams, 1986
- Fundamental aspects of ion beam mixingNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Initial phase formation and dissociation in the thin-film Ni/Al systemJournal of Applied Physics, 1985
- Ion mixing and phase diagramsNuclear Instruments and Methods in Physics Research, 1983
- Ion-induced amorphous and crystalline phase formation in Al/Ni, Al/Pd, and Al/Pt thin filmsApplied Physics Letters, 1983
- Thermal reactions between aluminum and palladium layered filmsThin Solid Films, 1980
- Review of binary alloy formation by thin film interactionsJournal of Vacuum Science and Technology, 1979
- Study of Al/Pd2Si contacts on SiJournal of Vacuum Science and Technology, 1977
- Kinetics of compound formation in thin film couples of Al and transition metalsJournal of Vacuum Science and Technology, 1976