Porous SiO2 films prepared by remote plasma-enhanced chemical vapour deposition – a novel antireflection coating technology for photovoltaic modules
- 31 January 2001
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 65 (1-4) , 71-77
- https://doi.org/10.1016/s0927-0248(00)00079-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Optimization and characterization of remote plasma-enhanced chemical vapor deposition silicon nitride for the passivation of p-type crystalline silicon surfacesJournal of Vacuum Science & Technology A, 1998
- FTIR spectroscopy and AES study of water containment in SiO2 thin filmsThin Solid Films, 1996
- Method for the preparation of porous silica antireflection coatings varying in refractive index from 122 to 144Applied Optics, 1992
- Large-range refractive-index control of silicon monoxide antireflection coatings using oblique incident thermal evaporationApplied Optics, 1991
- Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1986