Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography
- 1 July 2003
- journal article
- Published by Elsevier in Journal of Fluorine Chemistry
- Vol. 122 (1) , 17-26
- https://doi.org/10.1016/s0022-1139(03)00076-9
Abstract
No abstract availableKeywords
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