Electrical resistivity and crystallization of amorphous Cu-Ti alloys
- 1 July 1982
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 86, 187-194
- https://doi.org/10.1016/0022-5088(82)90204-1
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Effective-field distributions and resistivity minima in amorphous ferromagnetsPhysical Review B, 1979
- Critical test of the diffraction model in amorphous and disordered metalsPhysical Review B, 1978
- The crystallization kinetics of Fe-Ni based metallic glassesJournal of Materials Science, 1978
- The Crystallization Kinetics of Amorphous Pd78Ag4Si18Japanese Journal of Applied Physics, 1977
- Electrical resistivity of amorphous nickel phosphorus alloysSolid State Communications, 1976
- Cellular growth in a Pd781Cu55Si164 amorphous alloyScripta Metallurgica, 1976
- Crystallization of Fe, Co and Ni based metallic glassesMaterials Science and Engineering, 1976
- Structural Manifestations in Amorphous Alloys: Resistance MinimaPhysical Review Letters, 1975
- The crystallization kinetics of glassy Pd0.775Cu0.06Si0.165Journal of Non-Crystalline Solids, 1975
- Magnetic states in amorphous Fe−Pd−Si alloysJournal of Physics and Chemistry of Solids, 1971