Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
- 1 January 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 358 (1-2) , 90-93
- https://doi.org/10.1016/s0040-6090(99)00695-1
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Titanium oxide/aluminum oxide multilayer reflectors for “water-window” wavelengthsApplied Physics Letters, 1997
- Soft-x-ray multilayer mirrors with laterally varying film thicknesses fabricated using laser-beam-scanning chemical vapor depositionReview of Scientific Instruments, 1995
- Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporationApplied Physics A, 1994
- Optical emission and mass spectroscopic studies of the gas phase during the deposition of SiO2 and a-Si:H by remote plasma-enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1989
- Multilayers for x-ray opticsPublished by SPIE-Intl Soc Optical Eng ,1985
- Molybdenum-silicon multilayer mirrors for the extreme ultravioletApplied Optics, 1985
- Indirect plasma deposition of silicon dioxideJournal of Vacuum Science and Technology, 1982
- Synthetic Multilayers as Bragg Diffractors for X-Rays and Extreme Ultraviolet: Calculations of PerformanceAIP Conference Proceedings, 1981
- Controlled fabrication of multilayer soft-x-ray mirrorsApplied Physics Letters, 1980
- Low-Loss Reflection Coatings Using Absorbing MaterialsApplied Physics Letters, 1972