Silicon nitride and oxynitride films prepared by ion beam reactive sputtering
- 1 July 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 105 (3) , 197-202
- https://doi.org/10.1016/0040-6090(83)90285-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Reactive film preparationThin Solid Films, 1976
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- Thermodynamic approach to the quantitative interpretation of sputtered ion mass spectraAnalytical Chemistry, 1973
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Silicon Nitride Films by Reactive SputteringJournal of the Electrochemical Society, 1967