Nickel/Vanadium and Nickel/Titanium Multilayers for X-Ray Optics
- 1 June 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (6R) , 1215-1219
- https://doi.org/10.1143/jjap.29.1215
Abstract
Ni/V and Ni/Ti multilayers with 3–10 nm layer periods and 8 or 32 layer pairs were deposited with rf sputtering, and examined by X-ray diffraction and transmission electron microscopy(TEM). The increase of X-ray diffraction peak numbers proved that the sharper interfaces were formed under lower Ar pressure, and the estimated interfacial roughness for multilayers deposited at 2.1 Pa was 0.55 nm. The microcrystalline structure was observed by TEM in the Ni layer, and seemed to dominate the residual interfacial roughness.Keywords
This publication has 18 references indexed in Scilit:
- Transmission Electron Microscopy Study on Microstructure of Tungsten/Carbon Multilayer FilmsJapanese Journal of Applied Physics, 1989
- Compact scanning soft-x-ray microscope using a laser-produced plasma source and normal-incidence multilayer mirrorsOptics Letters, 1989
- Structure and properties of W/C and Ni/C multilayer filmsApplied Surface Science, 1988
- Solid-state interdiffusion reactions in Ni/Ti and Ni/Zr multilayered thin filmsApplied Physics Letters, 1987
- High-resolution electron microscopy study of x-ray multilayer structuresJournal of Applied Physics, 1987
- X-ray microscope with multilayer mirrorsApplied Optics, 1986
- Solid-state reaction and structure in compositionally modulated zirconium-nickel and titanium-nickel filmsPhysical Review B, 1986
- High-reflectivity multilayer monochromators for neutronsJournal of Applied Crystallography, 1986
- Interaction of superconductivity and itinerant-electron magnetism: Critical fields of Ni/V superlatticesPhysical Review B, 1986
- Molybdenum-silicon multilayer mirrors for the extreme ultravioletApplied Optics, 1985