Instrumentation for electron beam lithography
- 1 September 1974
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 10 (3) , 883-887
- https://doi.org/10.1109/TMAG.1974.1058450
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- X-Ray Lithography: A Complementary Technique to Electron Beam LithographyJournal of Vacuum Science and Technology, 1973
- IGFET Inverter Circuits made with Electron LithographyJournal of Vacuum Science and Technology, 1973
- E-Beam Writing Techniques for Semiconductor Device FabricationJournal of Vacuum Science and Technology, 1973
- Precision Electron Beam Microfabrication of Acoustic Surface Wave DevicesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1973
- A computer-controlled electron-beam machine for microcircuit fabricationIEEE Transactions on Electron Devices, 1972
- Epoxide-Containing Polymers as Highly Sensitive Electron-Beam ResistsJournal of the Electrochemical Society, 1971
- High-resolution Positive Resists for Electron-beam ExposureIBM Journal of Research and Development, 1968