Ab Initio Structure and Energetics for the Molecular and Dissociative Adsorption of NH₃ on Si(100)-2 × 1

This publication has 25 references indexed in Scilit:

• Contrasted behavior of Si(001) and Si(111) surfaces with respect to NH3 adsorption and thermal nitridation: a N 1s and Si 2p core level study with synchrotron radiation
  Surface Science, 1994
• Thermally grownSi3N4thin films on Si(100): Surface and interfacial composition
  Physical Review B, 1993
• Si(100)2 × 1: the clean and ammonia exposed surface studied with high resolution core-level spectroscopy
  Surface Science, 1992
• Morphological effect of a clean Si surface on NH3 dissociative adsorption
  Applied Surface Science, 1992
• Thermal nitridation of Si(100)-2 × 1 surface by NH3: XPS results
  Surface Science, 1989
• Photoemission studies of the reactions of ammonia and N atoms with Si(100)-(2×1) and Si(111)-(7×7) surfaces
  Physical Review B, 1988
• The reaction of Si(100) 2×1 with NO and NH3: The role of surface dangling bonds
  Journal of Vacuum Science & Technology B, 1987
• Photoemission study of ammonia dissociation on Si(100) below 700 K
  Physical Review B, 1987
• Kinetics of Si(100) nitridation first stages by ammonia: Electron- beam-induced thin film growth at room temperature
  Journal of Vacuum Science & Technology B, 1985
• Thermal nitridation of Si and SiO₂for VLSI
  IEEE Transactions on Electron Devices, 1985