Very high mobility HgTe films grown on GaAs substrates by molecular-beam epitaxy

Abstract
HgTe films have been grown in both the (100) and (111) orientations on (100) GaAs. In agreement with what has been reported for growth on II‐VI substrates, we find higher Hall mobilities in (100) films. An 80‐K mobility of 92 200 cm2 V1 s1 has been achieved. This is higher than has previously been reported for growth on (100) II‐VI substrates. The conditions for growing these films are described.