Theory of plasma chemical transport etching of gold in a chlorine plasma
- 1 October 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 85 (1) , 33-42
- https://doi.org/10.1016/0040-6090(81)90052-3
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etchingJournal of Applied Physics, 1979
- Plasma Etching of Titanium for Application to the Patterning of Ti‐Pd‐Au MetallizationJournal of the Electrochemical Society, 1977
- The Loading Effect in Plasma EtchingJournal of the Electrochemical Society, 1977
- Etching Characteristics of Silicate Glass Films in CF 4 PlasmaJournal of the Electrochemical Society, 1977
- Plasma Sheath Formation by Radio-Frequency FieldsPhysics of Fluids, 1963
- Vapor transport of solids by vapor phase reactionsJournal of Physics and Chemistry of Solids, 1962