Hyperfine Structure of the Neutral () Vacancy-Oxygen Center in Ion-Implanted Silicon
- 1 June 1972
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 5 (11) , 4274-4280
- https://doi.org/10.1103/physrevb.5.4274
Abstract
The intensity of the hyperfine spectrum associated with the -- isotopic configuration of the vacancy-oxygen () center was enhanced by ion implantation of into silicon. The hyperfine spectrum was measured by electron paramagnetic resonance. An analysis of the hyperfine spectrum indicates that the numerical values for the elements in the hyperfine coupling tensor are , , and . The hyperfine coupling tensor was analyzed in terms of the admixture of oxygen-valence orbitals into the one-electron paramagnetic molecular orbitals and . In particular, only 4.1% of and 1.8% of
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