Control of Wafer Temperature Uniformity in Rapid Thermal Processing Using an Optimal Iterative Learning Control Technique
- 1 June 2000
- journal article
- Published by Elsevier in IFAC Proceedings Volumes
- Vol. 33 (10) , 123-128
- https://doi.org/10.1016/s1474-6670(17)38529-4
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Control of rapid thermal processing: a system theoretic approachIEEE Transactions on Control Systems Technology, 1997
- Iterative learning control for discrete-time systems with exponential rate of convergenceIEE Proceedings - Control Theory and Applications, 1996
- N4SID: Subspace algorithms for the identification of combined deterministic-stochastic systemsAutomatica, 1994
- Temperature control in a rapid thermal processorIEEE Transactions on Electron Devices, 1992