Maskless ion beam assisted deposition of W and Ta films
- 1 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 163-170
- https://doi.org/10.1016/0167-9317(86)90043-2
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Ion Beam Assisted Deposition of Metal Organic Films Using Focused Ion BeamsJapanese Journal of Applied Physics, 1984
- Thin organic films produced by ion implantationApplied Physics Letters, 1984
- Synthesis of novel inorganic films by ion beam irradiation of polymer filmsApplied Physics Letters, 1983
- An AES-SIMS study of silicon oxidation induced by ion or electron bombardmentApplications of Surface Science, 1980
- Developer Characteristics of Poly‐(Methyl Methacrylate) Electron ResistJournal of the Electrochemical Society, 1975