R.F. diode sputtered platinum films
- 1 October 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 23 (3) , 323-336
- https://doi.org/10.1016/0040-6090(74)90016-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Tungsten metallization for LSI applicationsJournal of Vacuum Science and Technology, 1974
- X-Ray Determination of Stresses in Thin Films and Substrates by Automatic Bragg Angle ControlReview of Scientific Instruments, 1973
- Gas Incorporation into Sputtered FilmsJournal of Applied Physics, 1967
- ELECTRICAL RESISTIVITY CHANGES IN THIN METALLIC FILMS DUE TO ION IRRADIATIONApplied Physics Letters, 1967
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961
- Influence of the Angle of Incidence on Sputtering YieldsJournal of Applied Physics, 1959