Characteristics of Si3N4‐SiO2‐Ce2O3 Compositions Sintered in High‐pressure Nitrogen

Abstract
Full‐density Si3N4‐SiO2‐Ce2O3 compositions were prepared by sintering with 2.5 MPa nitrogen pressure at temperatures of 1900° and 2090°C. Room‐temperature flexural strengths near 700 MPa for sintered material compared favorably with the strength of hot‐pressed material. At 1370°C, where flexural strengths as high as 363 MPa were obtained, it was observed that the coarsest structure was the strongest and the finest structure was the weakest. One of the compositions tested, Si3N4‐8.7 wt% SiO2‐8.3 wt%‐Ce2O3, was found to have excellent 200‐h oxidation resistance at 700°, 1000°, and 1370°C, without incidence of 700° to 1000°C phase instability and cracking.

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