A new hydro-fluorinated amorphous silicon produced by using intermediate species SiF2
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 739-742
- https://doi.org/10.1016/0022-3093(83)90277-6
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Photo-Conductive, Low Impurity-Diffusive, Heat-Resisting a-Si Formed by Glow-Discharged Decomposition of SiF2 and H2 MixtureJapanese Journal of Applied Physics, 1983
- Low defect density amorphous hydrogenated silicon prepared by homogeneous chemical vapor depositionApplied Physics Letters, 1982
- The Deposition of Silicon Films by Pyrolytic Decomposition of SiF2 GasJournal of the Electrochemical Society, 1981
- Hydrogen elimination during the glow-discharge deposition of a-Si:H alloysApplied Physics Letters, 1981
- Electrical and optical properties of amorphous Si:F:H alloysPhilosophical Magazine Part B, 1979
- A new amorphous silicon-based alloy for electronic applicationsNature, 1978