Effects of He Gas Addition on the Production of Active Particles in rf Magnetron Sputtering
- 1 June 1996
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 35 (6R)
- https://doi.org/10.1143/jjap.35.3590
Abstract
We measured optical emission spectra during the deposition of Bi2Sr2Ca n -1Cu n O x (BSCCO) films by an rf magnetron sputtering method with a BSCCO powder target. It was shown that the active particles produced are ionized oxygen molecules and CuO radicals when He+O2 is used as a sputtering gas. The results of X-ray photoelectron spectroscopy indicated that the BSCCO films prepared using He gas have the same metal composition as the target. In addition, we confirmed that the use of He as a sputtering gas enhances the oxidation in the preparation of CuO films.Keywords
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