Electrical activation and damage annealing of boron-implanted silicon by flash-lamp irradiation
- 16 March 1984
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 82 (1) , 171-177
- https://doi.org/10.1002/pssa.2210820121
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Dose Dependence of the Flash Lamp Annealing of Arsenic-Implanted SiliconPhysica Status Solidi (a), 1983
- Flash lamp annealing of arsenic implanted siliconPhysica Status Solidi (a), 1981
- Laser annealing of boron-implanted siliconApplied Physics Letters, 1978