Internal Stress of ITO, IZO and GZO Films Deposited by RF and DC Magnetron Sputtering
- 1 January 2001
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room TemperatureJapanese Journal of Applied Physics, 1999
- Study on Crystallinity of Tin-Doped Indium Oxide Films Deposited by DC Magnetron SputteringJapanese Journal of Applied Physics, 1998
- Stress-related effects in thin filmsThin Solid Films, 1989