EEPROM-based Charging-Effects Sensors for Plasma Etching and Ion Implantation
- 1 January 1992
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 101-105
- https://doi.org/10.1109/iwlr.1992.657991
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Charging studies using the CHARM2 wafer surface charging monitorNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- A model and experiments for thin oxide damage from wafer charging in magnetron plasmasIEEE Electron Device Letters, 1992