Comparison of the Ablation Behavior of Polymer Films in the IR and UV with Nanosecond and Picosecond Pulses
- 1 February 1999
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 103 (8) , 1287-1294
- https://doi.org/10.1021/jp983609j
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Developing novel photoresists: microstructuring of triazene containing copolyester filmsApplied Surface Science, 1998
- Laser Ablation Dynamics of a Poly(methyl methacrylate) Film Doped with 5-Diazo Meldrum's AcidThe Journal of Physical Chemistry, 1995
- The mechanism of dopant-induced laser ablation. Possibility of cyclic multiphotonic absorption in excited statesChemical Physics Letters, 1994
- Laser polymer ablation threshold lowered by nanometer hot spotsApplied Physics Letters, 1994
- Multiphonon up-pumping and molecular hot spots in superheated polymers studied by ultrafast optical calorimetryChemical Physics Letters, 1992
- Laser ablation of doped polymers: transient phenomena as the ablation threshold is approachedMacromolecules, 1992
- Mechanism of laser-induced ablation of polymeric solidsPhilosophical Magazine Letters, 1991
- Shocked molecular solids: Vibrational up pumping, defect hot spot formation, and the onset of chemistryThe Journal of Chemical Physics, 1990
- Ultraviolet laser ablation of organic polymersChemical Reviews, 1989
- Dopant-induced ablation of poly(methyl methacrylate) by a 308-nm excimer laserMacromolecules, 1987