A novel MOVPE reactor with a rotating substrate
- 31 December 1988
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 93 (1-4) , 216-219
- https://doi.org/10.1016/0022-0248(88)90530-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- OMVPE of GaInAs on a spinning substrateJournal of Crystal Growth, 1988
- Vapor levitation epitaxy: system design and performanceJournal of Crystal Growth, 1986
- Instrumental aspects of atmospheric pressure MOVPE growth of InP and InP: GaInAsP heterostructuresJournal of Crystal Growth, 1986