Low-loss fiber-matched low-temperature PECVD waveguides with small-core dimensions for optical communication systems
- 1 September 1997
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Technology Letters
- Vol. 9 (9) , 1238-1240
- https://doi.org/10.1109/68.618490
Abstract
Plasma-enhanced chemical vapor deposition (PECVD) offers a simple way of fabricating (doped) silica layers on silicon. A new design of the waveguide core allows low-loss fiber matched waveguides with low birefringence without high-temperature annealing. The increased loss of doped plasma deposited silica due to hydrogen incorporation is overcome by reducing the core dimensions and increasing the refractive index contrast. The waveguides can easily be fabricated using standard PECVD technologies and resist masked reactive ion etching (RIE) etching. Integrated optical devices such as 1/spl times/8 power splitters, 1300/1550-nm wavelength multiplexers and thermooptical switches were successfully fabricated and tested.Keywords
This publication has 5 references indexed in Scilit:
- 10 m long silica-based waveguide with a loss of 1.7 dB/mPublished by Optica Publishing Group ,1995
- Less than 1 dB per meter propagation loss of silica waveguides measured using a ring resonatorJournal of Lightwave Technology, 1994
- Method of lines for the analysis of dielectric waveguidesJournal of Lightwave Technology, 1993
- Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on siliconMicroelectronic Engineering, 1992
- Simple technologies for fabrication of low-loss silica waveguidesElectronics Letters, 1992