Oxygen defect profile in implanted garnet
- 1 March 1983
- journal article
- Published by Elsevier in Journal of Magnetism and Magnetic Materials
- Vol. 35 (1) , 303-306
- https://doi.org/10.1016/0304-8853(83)90526-7
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- CEMS characterization of ion-implanted bubble garnetsJournal of Applied Physics, 1982
- Ion implantation profiles in bubble garnetsThin Solid Films, 1982
- Magnetic state of ion implanted layer in garnet bubble film: Temperature dependence studyIEEE Transactions on Magnetics, 1981
- Determination of the stress profile in ion implanted garnetsIEEE Transactions on Magnetics, 1981
- A nondestructive method to determine the stress distributions of neon-implanted garnet layersJournal of Applied Physics, 1981
- Crystalline and magnetic properties of an ion-implanted layer in bubble garnet filmsJournal of Applied Physics, 1978
- Differential etching of ion-implanted garnetJournal of Applied Physics, 1973
- Nuclear reaction analysis of boron and oxygen in siliconJournal of Radioanalytical and Nuclear Chemistry, 1972
- Microanalysis of the stable isotopes of oxygen by means of nuclear reactionsAnalytical Chemistry, 1967