Temperature dependence of H radical etching in the deposition of microcrystalline silicon alloy thin films by HG-sensitized photo-CVD
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 114, 801-803
- https://doi.org/10.1016/0022-3093(89)90725-4
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasmaJournal of Non-Crystalline Solids, 1983