Dual Electron Beam Processing System for Semiconductor Materials
- 1 January 1981
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High speed scanning electron beam annealing of ion-implanted silicon layersThin Solid Films, 1980
- Temperature distributions produced in semiconductors by a scanning elliptical or circular cw laser beamJournal of Applied Physics, 1980
- Electron-beam annealing of ion-implanted siliconElectronics Letters, 1979