Generation of a Large Electron Beam for Plasma Processing
- 1 May 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (5A) , L868-870
- https://doi.org/10.1143/jjap.28.l868
Abstract
A large-diameter (∼16 cm) electron beam in a range of energy from 5 to 30 eV was extracted from an ECR microwave plasma in order to control active species in plasma processes. The measurement of the electron energy distribution function revealed that the beam energy was linearly proportional to an externally applied bias. On the other hand, the beam flux turned out to be limited to 10–20% of the random thermal flux of electrons in the source plasma. The rate of production of radicals by the energetic beam was calculated and founed to be large enough for the beam source to be used in CVD or etching processes.Keywords
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