Anode Plasma Density Measurements in a Magnetically Insulated Diode
- 7 March 1983
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 50 (10) , 732-735
- https://doi.org/10.1103/physrevlett.50.732
Abstract
The surface-flashover anode plasma in a magnetically insulated ion diode was investigated spectroscopically. From the Stark broadening of the neutral hydrogen line an average electron density of about 2×/ was observed in the ≲ 1-mm anode plasma, 30 nsec into the 400-475-kV diode voltage pulse. Thereafter, the plasma front advanced into the diode gap at an average rate of 2 cm/μsec. This may be explained by the ionization of neutral atoms injected into the gap during flashover.
Keywords
This publication has 9 references indexed in Scilit:
- Charge-exchange neutral-atom filling of ion diodes: Its effect on diode performance and A-K shortingJournal of Applied Physics, 1981
- Anode plasma behavior in a magnetically insulated ion diodeJournal of Applied Physics, 1981
- Intense pulsed ion beams for fusion applicationsNuclear Fusion, 1980
- Ion beam annealing of semiconductorsApplied Physics Letters, 1980
- Magnetic focusing of intense ion beamsPhysics of Fluids, 1979
- High-current-pulsed linear ion acceleratorsJournal of Applied Physics, 1978
- Theory of He+2+O2 charge exchange laserJournal of Applied Physics, 1978
- Measurements of 400-MW/cm2 proton fluxesJournal of Applied Physics, 1977
- Generation of Intense Ion Beams in Pulsed DiodesPhysical Review Letters, 1973