Electrical and Chemical Properties of Photo-Cross-Linked Polymeric Insulating Materials
- 1 March 2005
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 44 (3L) , L416
- https://doi.org/10.1143/jjap.44.l416
Abstract
Photosensitive polymeric insulating films, which were prepared by mixing host polymers and a photosensitizer, exhibit high chemical resistance and excellent electrical properties. These polymer films formed by the spin-coating method were exposed through a mask to patterned radiation of UV light. The nonexposed areas of these films were dissolved by an appropriate solvent. Leakage current densities for these films are very low, approximately 5 ×10-7 ∼3 ×10-8 A/cm2 at a bias of 10.0 V. These polymer insulators are particularly suitable for plastic-based electronic device applications.Keywords
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