MODELLING OF SOLID-PHASE THIN-FILM REACTIONS INDUCED BY A SCANNING CW LASER
- 1 January 1980
- book chapter
- Published by Elsevier
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- A study of the mechanism of cw laser annealing of arsenic-implanted siliconJournal of Applied Physics, 1979
- Laser annealing for solid-phase thin-film reactionsApplied Physics Letters, 1979
- Temperature rise induced by a laser beam II. The nonlinear caseApplied Physics Letters, 1978
- Solid-phase epitaxy of implanted silicon by cw Ar ion laser irradiationApplied Physics Letters, 1978
- cw argon laser annealing of ion-implanted siliconApplied Physics Letters, 1978
- Substrate-orientation dependence of the epitaxial regrowth rate from Si-implanted amorphous SiJournal of Applied Physics, 1978
- Physical and electrical properties of laser-annealed ion-implanted siliconApplied Physics Letters, 1978