Effects of residual gases and rf power on ITO rf sputtered thin films
- 1 January 1987
- Vol. 37 (5-6) , 447-449
- https://doi.org/10.1016/0042-207x(87)90333-2
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Temperature and bias effects on the electrical properties of CdS thin films prepared by r.f. sputteringThin Solid Films, 1984
- Optical and electrical properties of RF-sputtered indium–tin oxide filmsPhysica Status Solidi (a), 1983
- Analysis of sputtering discharge by optical and mass spectrometry. I. Platinum and tantalum sputtered in argonJournal of Applied Physics, 1973