Adherent TiN films produced by ion beam enhanced deposition at room temperature
- 1 March 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 7-8, 915-919
- https://doi.org/10.1016/0168-583x(85)90494-x
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- The microstructure of type 304 stainless steel implanted with titanium and carbon and its relation to friction and wear testsThin Solid Films, 1983
- Carburization of steel surfaces during implantation of Ti ions at high fluencesJournal of Vacuum Science & Technology A, 1983
- Modification of niobium film stress by low-energy ion bombardment during depositionJournal of Vacuum Science and Technology, 1982
- Structure and properties of deposits grown by ion-beam-activated vacuum deposition techniquesThin Solid Films, 1979
- Film preparation using plasma or ion activationThin Solid Films, 1979