Effects of Cu seeding layer on Si grown by partially ionized beam in plasma enhanced chemical vapor deposition
- 23 June 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 347 (1-2) , 121-126
- https://doi.org/10.1016/s0040-6090(98)01739-8
Abstract
No abstract availableKeywords
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