Wafer charging and beam interactions in ion implantation
- 1 January 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 6 (1) , 405-411
- https://doi.org/10.1016/0168-583x(85)90665-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Experimental Determination of Current Paths of Ions Implanted into InsulatorsJapanese Journal of Applied Physics, 1976
- Sputtering of Vitreous Silica by 20- to 60-kev Xe+ IonsJournal of Applied Physics, 1961
- Radiation Effects of Bombardment of Quartz and Vitreous Silica by 7.5-kev to 59-kev Positive IonsPhysical Review B, 1960