Enhancement of submicron optical lithography performance using phase-only pupil filters
- 31 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4) , 95-98
- https://doi.org/10.1016/0167-9317(95)00202-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Creation of 3-D radiation fields to specificationand demonstrationusing an optical SLMElectronics Letters, 1994
- Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line LensJapanese Journal of Applied Physics, 1993
- Optimization of partially coherent optical system for optical lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Resolution limits of optical lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991