Contact-potential measurements of the adsorption of Cs, O2 and H2 on (110) Ta
- 31 October 1967
- journal article
- Published by Elsevier in Surface Science
- Vol. 8 (3) , 267-287
- https://doi.org/10.1016/0039-6028(67)90111-2
Abstract
No abstract availableThis publication has 37 references indexed in Scilit:
- Low energy electron diffraction study of the formation of TaO (111) on Ta (110)Surface Science, 1965
- Electron reflection from tungsten crystals, clean and with adsorbed Cs and COSurface Science, 1964
- Electron Reflection from Cesium-Coated Polycrystalline Metals at Low Primary EnergyJournal of Applied Physics, 1963
- Field-Emission Study of Carbon Monoxide on TantalumThe Journal of Chemical Physics, 1963
- WORK FUNCTION OF THE (311) PLANE OF TUNGSTENCanadian Journal of Physics, 1962
- Исследование вершин танталовых монокристалллов пространственно-эмиссионным микроскопомActa Physica Academiae Scientiarum Hungaricae, 1961
- Reflection of Slow Electrons from Tungsten Single Crystals, Clean and with Adsorbed MonolayersPhysical Review B, 1961
- Thermionic Emission from a Planar Tantalum CrystalPhysical Review B, 1957
- Thermionic EmissionReviews of Modern Physics, 1949
- The Contact Difference of Potential Between Tungsten and Barium. The External Work Function of BariumPhysical Review B, 1935