Next generation lithography
- 30 September 1998
- journal article
- research article
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 1 (2) , 93-97
- https://doi.org/10.1016/s1369-8001(98)00019-5
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Extreme ultraviolet lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- A review of ion projection lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Scattering with angular limitation projection electron beam lithography for suboptical lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- X-ray lithography: Status, challenges, and outlook for 0.13 μmJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Wavefront engineering from 500- to 100-nm CDPublished by SPIE-Intl Soc Optical Eng ,1997