Extreme ultraviolet lithography
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6) , 3142-3149
- https://doi.org/10.1116/1.590453
Abstract
An extreme ultraviolet(EUV)lithography tool using 13.4 nm radiation is being developed by a consortium of integrated circuit (IC) manufacturers to support 100 nm imaging for integrated circuit production. The 4×, 0.1 NA alpha tool has a >1 μm depth of focus, all reflective optics, a xenon laser plasma source, and robust reflective masks. The technology is expected to support feature scaling down to 30 nm.Keywords
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