Preoxide-Controlled Oxidation for Very Thin Oxide Films
- 1 January 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (1S) , 294-297
- https://doi.org/10.1143/jjap.32.294
Abstract
Very thin oxide films with high insulating performance and high reliability are formed by controlling preoxide growth with an ultraclean oxidation method during heating of the wafer to thermal oxidation temperature. The current level through the preoxide-controlled ultraclean oxide is lower than that through the oxide incorporating a thicker preoxide, and the preoxide-controlled ultraclean oxide has high reliability with respect to hot electron injection.Keywords
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