Patterning of organic layers using negative and positive working top-CARL process
- 30 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4) , 255-258
- https://doi.org/10.1016/0167-9317(93)90067-f
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Benefits and prospects of aqueous silylation for novel dry developable high-resolution resistsPublished by SPIE-Intl Soc Optical Eng ,1990
- Chemical amplification of resist lines (CARL)Microelectronic Engineering, 1990
- Image Reversal Techniques With Standard Positive PhotoresistPublished by SPIE-Intl Soc Optical Eng ,1984