Highly photo-conductive amorphous silicon produced by thermal CVD method using intermediate species SiF2
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 793-796
- https://doi.org/10.1016/0022-3093(85)90779-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Kinetics and mechanism of amorphous hydrogenated silicon growth by homogeneous chemical vapor depositionApplied Physics Letters, 1981
- Silicon-Fluorine Chemistry. I. Silicon Difluoride and the Perfluorosilanes1Journal of the American Chemical Society, 1965