Electronic structure ofErSi2andYSi2
- 15 July 1992
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 46 (3) , 1299-1304
- https://doi.org/10.1103/physrevb.46.1299
Abstract
We present a theoretical and experimental study of erbium and yttrium disilicides. These materials are representative of the trivalent heavy-rare-earth disilicides that can be epitaxially grown on Si(111). The densities of states are obtained using the augmented-plane-wave method. They are used to calculate the Auger Si LVV spectra. For the measurements, we used x-ray photoemission and Auger electron spectroscopy on monocrystalline . Theoretical and experimental results are compared and show structures due to Er-Si hybridization. Although the valence-band results are in qualitative agreement, we find significant differences that could be related to effects due to silicon vacancies.
Keywords
This publication has 23 references indexed in Scilit:
- Room-temperature growth of Er films on Si(111): A photoelectron spectroscopy investigationPhysical Review B, 1991
- Valence photoelectron spectroscopy of Gd silicidesPhysical Review B, 1990
- Fabrication and structure of epitaxial Er silicide films on (111) SiApplied Physics Letters, 1989
- Co/Si(111) interface investigated by bremsstrahlung isochromat spectroscopy and x-ray-induced photoemission spectroscopyPhysical Review B, 1989
- Chemical bonding in layered Y Si≈1.7Solid State Communications, 1988
- d and f metal interface formation on siliconSurface Science Reports, 1987
- AES and EELS study of ErSi2 and its behaviour under ion bombardment and oxygen exposureSolid State Communications, 1986
- Epitaxial growth of rare-earth silicides on (111) SiApplied Physics Letters, 1986
- Low Schottky barrier of rare-earth silicide on n-SiApplied Physics Letters, 1981
- Explicit local exchange-correlation potentialsJournal of Physics C: Solid State Physics, 1971